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The Cascade Microtech 12000-series probe systems allow you to access the full measurement range of your test instrumentation. Noise, leakage, stray capacitance and measurement settling times have been greatly reduced. Whatever the application: DC or RF device characterization, wafer-level reliability, e-test, modeling, or yield enhancement, the 12000-series probe stations assure best-in-the-world measurements...
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The Cascade Microtech 12000-series probe systems allow you to access the full measurement range of your test instrumentation. Noise, leakage, stray capacitance and measurement settling times have been greatly reduced. Whatever the application: DC or RF device characterization, wafer-level reliability, e-test, modeling, or yield enhancement, the 12000-series probe stations assure best-in-the-world measurements...
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The Glen R3A Plasma Cleaning System is PLC controlled and offers real-time plain English readout of system operating parameters together with remedial action in the event of an abort. This 500 watt plasma cleaner has two 14 x 14-inch electrode sets (capable of up to 8 sample trays) which can be quickly configured to provide any of these three plasma modes...
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Signatone S-251-6 Probe Station
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The Hitachi S-7000 CD SEM is an in-process evaluation tool for monitoring wafers during the during the various process steps. Non-destructive wafer inspection is ideal for observing complete wafers to identify problems such as stacking-faults, deep holes, etc...
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The Karl Suss MJB 3 Mask Aligner is designed for high resolution photolithography in a laboratory, development or pilot production environment. The MJB 3 offers unsurpassed flexibility in the handling of irregular shaped substrates and pieces of differing thickness, as well as standard size wafers up to 3" in diameter...
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The Matrix System One Model 105 plasma asher uses oxygen, plasma and heat to remove photoresist on silicon, GaAs and other substrates...
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The Samco Model UV-300H UV-Ozone Stripper Cleaner can be used for stripping or cleaning organic materials from a wide variety of substrate materials. The system process substrates using a combination of UV light, ozone and heat to clean substrates at atmospheric pressure...
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The Surface Technology Systems Multiplex range of plasma systems combine a single wafer or batch vacuum loadlock with STS etch plasma source to produce a platform of unrivaled quality and reliability for both R&D and pilot-production applications...
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The Cascade Microtech 12000-series probe systems allow you to access the full measurement range of your test instrumentation. Noise, leakage, stray capacitance and measurement settling times have been greatly reduced. Whatever the application: DC or RF device characterization, wafer-level reliability, e-test, modeling, or yield enhancement, the 12000-series probe stations assure best-in-the-world measurements...
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The UV-Ozone cleaning process provides a simple, inexpensive, and fast method of obtaining ultra-clean surfaces free of organic contaminants on most inorganic substances...
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