Karl Suss MJB3 Mask Aligner
Product Code: 10141
Our Price: $31,900.00
Description
The Karl Suss MJB 3 Mask Aligner is designed for high resolution photolithography in a laboratory, development or pilot production environment. The MJB 3 offers unsurpassed flexibility in the handling of irregular shaped substrates and pieces of differing thickness, as well as standard size wafers up to 3" in diameter.
Microscope: M400 Normalfield with revolving objective turret and trinocular microscope head
Microscope Objectives: Leitz NPL 5X, 10X, and 20X objectives
Microscope Oculars: 10X eyepieces
Lamphouse: 350W lamphouse
Lamp: 350W High Pressure Mercury (Hg) lamp is currently installed
Exposure Optics: UV400
Optical Sensor: CH1: 365nm, CH2: 405nm
Timer: Digital
CIC Power Supply: CIC 1000 constant intensity controller
NOTE: THIS MJB 3 CAN ALSO BE ORDERED FOR THE FOLLOWING CONFIGURATIONS:
DUV APPLICATIONS (254nm) IR ALIGNMENT. PLEASE CONTACT US FOR DETAILS AND PRICING
Tooling: Includes one (1) set of standard mask holder and matching wafer alignment chuck to customer''s desired wafer size
Vib/Iso Table: Sold separately; subject to availability at time of order