Description
The UV-Ozone cleaning process provides a simple, inexpensive, and fast method of obtaining ultra-clean surfaces free of organic contaminants on most inorganic substances, such as quartz, silicon, gold, nickel, aluminum, gallium arsenide, alumina, etc. The process is ideal when thin film deposition with excellent adhesion to the substrate is required. Ultra-clean surfaces can easily be achieved by UV/Ozone processing in one to several minutes after the substrate has been cleaned by conventional techniques.
Source Size: 10" x 10"
Active Area: 100 sq. in.
Overall Machine Dimensions - Door Closed (w x d x h): 14" x 23.75" x 14.5"
Overall Machine Dimensions - Tray Extended (w x d x h): 14" x 33" x 14.5"
Number of Sliding Trays: 1
Construction: Stainless Steel (cabinet & tray)
Power Requirements: 110VAC, 60Hz, 5 amp (max)
Ozone Exhaust Shroud: Yes
Exhaust Port Opening: 3" diameter
Required Exhaust: 100cfm (not supplied with unit)
Timer: 0-999 seconds/minutes/hours
Audible End-of-Cycle Beeper: Yes
"UV ON" Indicator: Yes
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