|
|
|
|
|
|
|
|
|
|
The Cascade Microtech 12000-series probe systems allow you to access the full measurement range of your test instrumentation. Noise, leakage, stray capacitance and measurement settling times have been greatly reduced. Whatever the application: DC or RF device characterization, wafer-level reliability, e-test, modeling, or yield enhancement, the 12000-series probe stations assure best-in-the-world measurements...
|
Cascade Microtech 11000-series probe systems allow you to access the full measurement range of your test instrumentation. Noise, leakage, stray capacitance and measurement settling times have been greatly reduced. Whatever the application: DC or RF device characterization,wafer-level reliability, e-test, modeling, or yield enhancement, the 11000-series probe stations assure best-in-the-world measurements...
|
|
|
|
|
|
|
|
|
|
|
|
The Cascade Microtech 12000-series probe systems allow you to access the full measurement range of your test instrumentation. Noise, leakage, stray capacitance and measurement settling times have been greatly reduced. Whatever the application: DC or RF device characterization, wafer-level reliability, e-test, modeling, or yield enhancement, the 12000-series probe stations assure best-in-the-world measurements...
|
The Cascade Microtech 12000-series probe systems allow you to access the full measurement range of your test instrumentation. Noise, leakage, stray capacitance and measurement settling times have been greatly reduced. Whatever the application: DC or RF device characterization, wafer-level reliability, e-test, modeling, or yield enhancement, the 12000-series probe stations assure best-in-the-world measurements...
|
|
|
|
|
|
|
|
|
|
|
|
The Glen R3A Plasma Cleaning System is PLC controlled and offers real-time plain English readout of system operating parameters together with remedial action in the event of an abort. This 500 watt plasma cleaner has two 14 x 14-inch electrode sets (capable of up to 8 sample trays) which can be quickly configured to provide any of these three plasma modes...
|
The Samco Model UV-300H UV-Ozone Stripper Cleaner can be used for stripping or cleaning organic materials from a wide variety of substrate materials. The system process substrates using a combination of UV light, ozone and heat to clean substrates at atmospheric pressure...
|
|
|
|
|
|
|
|
|
|
The UV-Ozone cleaning process provides a simple, inexpensive, and fast method of obtaining ultra-clean surfaces free of organic contaminants on most inorganic substances...
|
|