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Hitachi S-7000 Critical Dimension Scanning Electron Microscope (CD SEM)
Hitachi S-7000 Critical Dimension Scanning Electron Microscope (CD SEM)


 
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Product Code: 10040
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Description
 
The Hitachi S-7000 CD SEM is an in-process evaluation tool for monitoring wafers during the during the various process steps. Non-destructive wafer inspection is ideal for observing complete wafers to identify problems such as stacking-faults, deep holes, etc.

Date of Manufacture:    1991

Wafer Size:    Accommodates 4", 5" and 6" wafers. Set size = 5".

Secondary Electron Image Resolution:    15nm (150 angstroms) at 1kV

Magnification:    100x to 100,000x

CD Measurement Range:    0.05 to 100 microns

Electron Beam Source:    Field emission electron gun

Accelerating Voltage(V0):    0.7~3kV (in increments of 100V)

Emission Extracting Voltage(V1):    0~6.3kV

Lens System:    2-stage electromagnetic lens reduction

Objective Lens Aperture:    Moveable type(4 openings selectable and alignable outside column

Stigmator:    8-pole electromagnetic type(X,Y)

Scanning Coil:    2-stage electromagnetic type

Specimen Stage Movement:    X-direction = 150nm, Y-direction = 150nm, Z-direction (working distance) = 5 to 15mm, T (tilt) angle = 0 to 60 degrees, R (rotation) angle = 360 degrees

Wafer Holder:    Holder replaceable for each wafer size

Wafer Setting:    Auto vacuum chucking using orientation flat reference

Wafer Transfer:    Wafer cassette to wafer holder in loader chamber (automatic)

Auto Loader:    Single-cassette loading, random accessing

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